Indium tin oxide is a widely used transparent conducting oxide for its two main properties: electrical conductivity and optical transparency, as well as the ease with which it can be deposited as a thin film.
The etching of microscopic patterns on substrates coated with Indium Tin Oxide (ITO) have the ability to combine electrical conductivity and optical transparency.
We use its multi-faceted micro lithography capabilities to pattern Indium Tin Oxide (ITO) coated substrates using direct-write laser, direct-write e-beam, optical reduction and full field exposure lithography. The key to our proprietary micro-patterning capabilities is its ability to deposit extremely uniform thin film coatings such as Indium Tin Oxide (ITO), which is critical in the lithographic process.
Patterned Indium Tin Oxide (ITO) substrates are mainly used to make transparent conductive coatings for liquid crystal displays, flat panel displays, plasma displays, touch panels, solar cells and EMI shieldings.
Photo Sciences uses its photomask lithography equipment, and thin film coating processes to etch micro patterns into Indium Tin Oxide (ITO) coatings on various substrate materials. The transparency, temperature and conductive characteristics of Indium Tin Oxide (ITO) allows it to be useful to a whole range of nano-scale technologies and high temperature environments.
The minimum ITO thickness we image is 100 Angstrom and resistance can range from 250 – 450 ohms per square. We offer thicker coatings for resistance in the range of 10 – 15 ohms per square.