A technical glossary of terms used in photomask manufacturing.

A hard defect is any flaw affecting the photomask mask, other than contamination. One class of defects includes ...

A die is a single complete device image. A primary die (also called the primary pattern) contains the device design that is used ...

Photomask photo resist development is a critical step in photo resist processing because it plays a key role in defining ...

The writing equipment writes the geometry onto the blank mask plate by exposing the photo resist to a UV light source, a laser or an electron beam ...

The steps involved in a typical photomask writing and development process using ...

Photomasks must be of the highest quality and must meet a wide variety of customer specifications. The photomask quality requirements are usually ...

There are two most common types of substrate material used for making photomasks are quartz (fused silica) and Soda Lime ...

Photomasks can be separated into two main categories; conventional binary masks and advanced phase-shift masks. A binary mask consists of a ...

Various terminologies are used to describe the tone of both pattern and background areas of a photomask.